Mass range

50, 300 or 510 amu

Minimum detectable

concentration (HALO)

2X10^-13 mbar

Minimum detectable

concentration (3F)

2X10^-14 mbar

Minimum detectable

concentration (3F-PIC)

2X10^-15 mbar

Ion Source

Range of electron impact

ion source types available

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and electron multiplier

Mounting flange (HALO)

DN-35-CF (2.75"/70mm OD Conflat type)

Mounting flange

(3F – Triple Filter)

DN-63-CF (4.5”/114mm OD Conflat type)

Standard RGA

A radially symmetric configuration

for general applications

UHV Low Profile

Optimised for UHV TPD

Studies

Closed Source

For direct gas input with differential

pumping stage for the analyser

XBS Cross Beam

For MBE deposition rate monitoring

and control

Basic Cross Beam

Use where the beam may be liable to

condense on ioniser surfaces

Laser Cross Beam

2 orthogonal unobstructed pathways

for laser photon ionisation

4 Lens Ion Optics

with Integrated Ioniser

For electron, photon and laser

stimulated desorption studies

Platinum Ion Source

For improved operation in

reactive gases

Gold Plated Ion Source

To minimise the effects of

source outgassing at UHV

Mass range

100 amu

HMT - high pressure

RGA mode

Operation to 5 x 10^-3 mbar

RGA - mode

Detection to 2 X 10^-13 mbar

Leak detection mode

Set to use helium search

gas as standard

Mounting flange

DN-35-CF (70mm OD

Conflat type)

Detector (Standard)

Faraday cup

Detector (Optional) 

Electron multiplier

Mass range

200 amu

Minimum detectable

concentration

5 x 10^-14 mbar

Ion Source

Gold plated ion source

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and

electron multiplier

Mounting flange

DN-35-CF (2.75"/70mm OD

Conflat type)

Mass range

200 or 300 amu

Minimum detectable

partial pressure

2 x 10^-13 mbar

Leak detect mode

Set to use helium search

gas as standard

Detector

Faraday cup and

Electron multiplier

Quadrupole gauge construction

configured for MBE

Yes

Molybdenum gauge wiring

instead of copper

Yes

Ion source shroud to prevent

contamination

Yes

Thermal extender for RGA

operation during bakeout

Yes (Optional)

Mounting flange

DN-35-CF (70mm OD

Conflat type)

Mass range

320 or 510 amu

Cross beam ion source

CAD configured multiple

X-beam source

Beam acceptance angle

+/- 35 degree to axis

Growth rate determination 

Typically < 0.01 Angstrom / second

Leak detect mode

Set to use helium search gas

as standard 

Deposition rate monitoring

Analogue outputs for

control- 4, 8 or 16 channels

Z - drive option 

Liner drive option for

precise positioning

Water cooled shroud option 

Yes (protects against

radiant heat sources)

Detector 

Faraday cup and

Electron multiplier

Mass range

200 amu

Minimum detectable

concentration

Sub PPM

detection levels

Dual mode operation

Conventional RGA, TIMS

APSI -MS Appearance

potential soft ionisation

Yes

Automatic operation

Yes

Template driven software

Yes

Quantitative data output

Yes

Mounting flange

DN-35-CF (70mm OD

Conflat type)

Detector

Faraday cup and electron

multiplier

Mass range

50, 300, 510, or 1000 amu

Minimum detectable

concentration

2 x 10^-14  mbar 

Ion Source

Range of electron impact ion

source types available

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and electron multiplier

Mounting flange

DN-100-CF (6"/150mm OD Conflat type)

9mm rod diameter

systems adaptor

DN-63-CF (4.5”/114mm OD Conflat type)

Mass range

50, 300 or 510 amu

Minimum detectable

partial pressure

5 X 10^-15 mbar: 1X10^-16 mbar

Fast data acquisition

 > 500 measurements/second

Low profile ion source

Optimised for desorption

studies

Signal gating input

100 nano second signal

gating resolution

Ion Source control

Yes

Mass range

50, 300, 510, 1000, or 2500 amu

Pulse ion counting detector

Positive and negative 

ion detection

DMM-dynamic multi mode

Uniquely applied for the electron

attachment ionization technique

for electronegative gas studies

Minimum detectable

partial pressure

5 X 10^-15 mbar : 1X10^-16 mbar

Fast measurement speed

Up to 500 measurements

per second

Mass range

50, 300, 510, 1000, or 2500 amu

Pulse ion counting

detector

Positive and negative ion detection

Integral IDP ion optics

Optimised for low energy ion

detection in ESD or PSD studies.

DMM-dynamic multi mode

uniquely applied for the electron

attachment ionization technique

for electronegative gas studies

External pulse gating input 

100 nano second signal gating

resolution