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RGA Series
For the examination of components
present in a vessel or evolved from a
process
Ion Source Options
A range of electron impact ion sources
that can be supplied with any of our
RGAs
HMT
A dual mode RGA system for vacuum
diagnostics and process monitoring
HAL 201 RC
A Residual Gas Analyser configured for
demanding UHV applications
HALO 201 MBE
For molecular beam epitaxy applications
XBS
An MBE deposition flux rate monitor
qRGA
For tokamak/torus fusion research
3F Series 1000/2000 RGA
For high precision scientific and process
applications
3F-PIC
Transient mass spectrometer for fast
event UHV studies
EPIC
A system for UHV analysis of neutrals,
radicals and ions
IDP
A system for analysis of ions, neutrals
and radicals in UHV desorption studies
Contact us for more informations
Mass range
50, 300 or 510 amu
Minimum detectable
concentration (HALO)
2X10-13 mbar
concentration (3F)
2X10-14 mbar
concentration (3F-PIC)
2X10-15 mbar
Ion Source
Range of electron impact
ion source types available
Ion Source control
Yes
Electron emission
Software variable 1µA to 2mA
Electron energy
Software variable 0V to 150 eV
Ion energy
Software variable 0V to 10 eV
Detector
Faraday cup and electron multiplier
Mounting flange (HALO)
DN-35-CF (2.75"/70mm OD Conflat type)
Mounting flange
(3F – Triple Filter)
DN-63-CF (4.5”/114mm OD Conflat type)
Standard RGA
A radially symmetric configuration
for general applications
UHV Low Profile
Optimised for UHV TPD
Studies
Closed Source
For direct gas input with differential
pumping stage for the analyser
XBS Cross Beam
For MBE deposition rate monitoring
and control
Basic Cross Beam
Use where the beam may be liable to
condense on ioniser surfaces
Laser Cross Beam
2 orthogonal unobstructed pathways
for laser photon ionisation
4 Lens Ion Optics
with Integrated Ioniser
For electron, photon and laser
stimulated desorption studies
Platinum Ion Source
For improved operation in
reactive gases
Gold Plated Ion Source
To minimise the effects of
source outgassing at UHV
100 amu
HMT - high pressure
RGA mode
Operation to 5 x 10-3 mbar
RGA - mode
Detection to 2 X 10-13 mbar
Leak detection mode
Set to use helium search
gas as standard
DN-35-CF (70mm OD
Conflat type)
Detector (Standard)
Faraday cup
Detector (Optional)
Electron multiplier
200 amu
concentration
5 x 10-14 mbar
Gold plated ion source
Faraday cup and
electron multiplier
DN-35-CF (2.75"/70mm OD
200 or 300 amu
partial pressure
2 x 10-13 mbar
Leak detect mode
Quadrupole gauge construction
configured for MBE
Molybdenum gauge wiring
instead of copper
Ion source shroud to prevent
contamination
Thermal extender for RGA
operation during bakeout
Yes (Optional)
320 or 510 amu
Cross beam ion source
CAD configured multiple
X-beam source
Beam acceptance angle
+/- 35 degree to axis
Growth rate determination
Typically < 0.01 Angstrom / second
Set to use helium search gas
as standard
Deposition rate monitoring
Analogue outputs for
control- 4, 8 or 16 channels
Z - drive option
Liner drive option for
precise positioning
Water cooled shroud option
Yes (protects against
radiant heat sources)
Sub PPM
detection levels
Dual mode operation
Conventional RGA, TIMS
APSI -MS Appearance
potential soft ionisation
Automatic operation
Template driven software
Quantitative data output
Faraday cup and electron
multiplier
50, 300, 510, or 1000 amu
2 x 10-14 mbar
Range of electron impact ion
source types available
DN-100-CF (6"/150mm OD Conflat type)
9mm rod diameter
systems adaptor
5 X 10-15 mbar: 1X10-16 mbar
Fast data acquisition
> 500 measurements/second
Low profile ion source
Optimised for desorption
studies
Signal gating input
100 nano second signal
gating resolution
50, 300, 510, 1000, or 2500 amu
Pulse ion counting detector
Positive and negative
ion detection
DMM-dynamic multi mode
Uniquely applied for the electron
attachment ionization technique
for electronegative gas studies
5 X 10-15 mbar : 1X10-16 mbar
Fast measurement speed
Up to 500 measurements
per second
Pulse ion counting
detector
Positive and negative ion detection
Integral IDP ion optics
Optimised for low energy ion
detection in ESD or PSD studies.
uniquely applied for the electron
External pulse gating input
100 nano second signal gating
resolution
Created Alpha