TF-LFA L54 – Laser Flash Analyzer for thin films
TF-LFA L54 (Frequency Domain Thermoreflectance) thermal analyzer for reliable, high-precision measurement of thermal conductivity and thermal diffusivity in ultra-thin films (10 nm – 20 µm).
TF-LFA L54: Frequency Domain Thermoreflectance for Thin Film Thermal Analysis
The LINSEIS TF-LFA L54 is an advanced, laser-based measurement system utilizing the Frequency Domain Thermoreflectance (FDTR) technique for non-contact, high-precision thermal characterization of thin films and multilayer structures. It enables the accurate determination of thermal conductivity, thermal diffusivity, thermal effusivity, volumetric heat capacity, and thermal boundary conductance, even in ultra-thin layers down to a few nanometers.
Designed for high-end research and industrial applications, the TF-LFA L54 combines exceptional sensitivity, a wide temperature range (from room temperature up to 500 °C), and modular options for anisotropy analysis, sample mapping, and optical visualization. This ideal system delivers outstanding precision, stability, and flexibility, making it suitable for the characterization of semiconductors, coatings, thermoelectric materials, LEDs, and other advanced thin-film technologies.
Unique Features
The TF-LFA L54 with Optical Technology Upgrade utilizes the Frequency Domain Thermoreflectance (FDTR) method for contactless, high-precision thermal analysis of thin films. This advanced optical approach ensures accurate, stable, and reproducible measurements across a wide range of material systems and operating conditions.
Key advantages of FDTR technology
New hardware features
☑️ Advanced Optical Design – dual-laser system with modulated pump laser (405 nm) and continuous-wave probe laser (532 nm) ensures precise, stable, and high-sensitivity measurements even for ultra-thin films
☑️ Automatic Focus Adjustment – integrated auto-focusing system continuously optimizes laser alignment during measurement, ensuring reproducible results without manual intervention
☑️ Thermal Mapping Function – optional mapping mode enables spatially-resolved analysis of thermal properties across multiple points or areas, ideal for inhomogeneous films and coating uniformity verification
Key Features
☑️ Contactless Optical Measurement
Using the Frequency Domain Thermoreflectance (FDTR) method, the TF-LFA L54 performs non-contact thermal analysis with laser-based precision — ideal for delicate thin films and microstructures.
☑️ Comprehensive Thermal Characterization
The system simultaneously determines thermal conductivity, diffusivity, effusivity, volumetric heat capacity and thermal boundary conductance — without assumptions about density or heat capacity.
☑️ Automatic Focus and Alignment
An integrated auto-focusing system continuously adjusts the laser position during operation, ensuring maximum stability, repeatability, and measurement accuracy for every sample.
☑️ Integrated LINSEIS platform
The integrated LINSEIS software offers a comprehensive solution that combines hardware and software for maximum process reliability and precision. The standardized platform enables seamless integration of components and devices from external partners – for a particularly robust and reliable overall system.
Specifications
Discover the high-performance TF-LFA – designed for cutting-edge thin-film analysis:
☑️Measurement method: Frequency Domain Thermoreflectance (FDTR) for non-contact, laser-based thermal analysis
☑️Analyzed parameters: Thermal conductivity, diffusivity, effusivity, volumetric heat capacity, and interface conductance
☑️Optical alignment: Dual-laser configuration with automatic focusing for maximum stability and precision
☑️Anisotropy option: Measures in-plane and cross-plane thermal conductivity of multilayer and 2D materials
☑️Thermal mapping: Surface mapping mode for evaluating film homogeneity and coating quality
IDEAL FOR
The Linseis TF-LFA is ideal for applications requiring detailed thermal property analysis of thin films and layered structures, particularly in:
- Semiconductors: Characterizing thermal properties critical for microelectronics and integrated circuits.
- Thermoelectrics: Evaluating materials for energy conversion efficiency.
- LEDs and Optoelectronics: Measuring heat dissipation in light-emitting devices.
- Nanotechnology: Thermal management of nanostructures and ultrathin materials.
- Coatings and Interfaces: Analyzing thermal resistance in multi-layered and thin-film coatings
These capabilities support research and development in advanced materials and thermal management technologies.
FEATURES
MODEL |
TF-LFA |
|---|---|
| Sample dimensions: | Any shape between 2mm x 2mm and 25mm x 25mm lateral size |
| Thin film samples: | 10nm up to 20μm* (depends on sample) |
| Temperature range: | RT, RT up to 200/500°C Sample holder for 4“ Wafer (only RT) |
| Measured properties: | Thermal conductivity Thermal diffusivity Thermal interface resistance Volumetric specific heat capacitiy Thermal effusivity |
| Options: | Anisotrophy: Measurement of cross-plane and in-plane thermal propertiesSample mapping: Scanning multiple positions of the sample pointwise or clusterwise. Mapping area: 10 mm² Stepsize: 50 μmCamera: Allows the user to view the present sample surface and the position of the laser beams to record the actual measurement position. |
| Atmosphere: | inert, oxidizing or reducing vaccuum up to 10E-4mbar |
| Diffusivity measuring range: | 0.01mm2/s up to 1200mm2/s (depends on sample) |
| Pump laser: | CW Laser (405 nm, 300 mW, modulations frequency up to 200 MHz) |
| Probe laser: | CW Laser (532 nm, 25 mW) |
| Photodetector: | Si Avalanche Photodetector, active diameter: 0.2 mm, bandwidth: DC – 400MHz |
| Power supply: | AC 100V ~ 240V, 50/60 Hz, 1 kVA |
| Software: | Included. Software package using multi-layer analysis for calculation of thermophysical properties |
| *Actual thickness range depends on sample | |
